Todays singleexposure, 193nm wavelength lithography reached its physical limit at 40nm halfpitch. Double patterning to the rescue lele, lfle, sadp part. Typically, double patterning refers to the lithoetchlithoetch lele pitchsplitting process in the fab, according to mentor graphics. Double patterning and hypernumerical aperture immersion. Self aligned double and quadruple patterning aware grid. Pdf double patterning technology friendly detailed routing. In order to achieve this, some version of double patterning dp technology will need to be combined with established techniques. By creating a central composite design centered about pressure, power, and gas. It is one of the many resolution enhancement techniques ret that have been introduced to push the limit of optical lithography.
Introduction to double patterning which is used extensively for printing transistors and other features in front end of line feol flow in a semiconductor chip. Pdf effective decomposition algorithm for selfaligned. Introduction 193nm optical immersion lithography is approa ching its. As this work was a proofofconcept, we used commercially available resins. Future work try to be free from color constrains of pins in our sadp routing method. Volume 8 issue 1 journal of micronanolithography, mems. This work focuses on the simulation and deposition for optical optimization of a carbon hard mask using plasma enhanced chemical vapor deposition pecvd. Pdf assessing chiplevel impact of double patterning. Sokudo breakfast forum semicon west 2008 2 contents background. We demonstrated two double patterning dp processes in nanoimprint lithography. If there is no enough space to insert a stitch for the undecomposable pattern, a native conflict is generated. To realize double patterning lithography, patterns located within a subresolution dis. Eda solutions for double patterning lithography semantic scholar. Stateoftheart 193 nm tool with a numerical aperture of 1.
As such, double patterning lithography dpl is the most promising option to generate the required lithography resolution, where the target layout is printed with two separate imaging processes. Double patterning lithography is extensively used to increase the halfpitch resolution. Double, triple and quadruple patterning and future lithography. Optical microlithography is a process very similar to photographic printing. Despite difficulties arising with respect to pattern deformation, the second pattern was successfully imprinted on the first. Double patterning techniques the other way is to decrease the wavelength of the light used in patterning. Minimization of these effects is also essential for the adoption of the highna 0. Selfaligned double patterning sadp process is one of several dpt approaches, and most likely be introduced into. Singlemask doublepatterning lithography for reduced cost. Eda solutions for double patterning lithography by minoo mirsaeedi athesis presentedtotheuniversityofwaterloo inful. Beyond that, double patterning immersion lithography is considered to be one of the promising technologies meeting the requirements of the nextgeneration 32nm technology node. Pdf eda solutions for double patterning lithography. Multiple patterning enables chipmakers to image ic designs at 20nm and below.
Selfaligned double patterning layout decomposition with complementary ebeam lithography jhihrong gao, bei yu and david z. Abstractin double patterning lithography dpl layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors corresponding to different exposures if their spacing is less than the minimum coloring spacing. To have a better sadp layout decomposability of routing patterns, we. While many resolution enhancement technologies ret have been developed recently, including sourcemask optimization smo1, and pixilated illumination2 schemes for the scanner, the overarching requirement for the light source in double patterning has been a need for improved optical performance stability and higher. Patterning is the backbone of scaling, which has reduced the size of the transistor to where it is today, in turn making modern electronic devices increasingly affordable. Layout decomposition approaches for double patterning lithography article pdf available in ieee transactions on computeraided design of integrated circuits and systems 296. Selfaligned doublepatterning layout decomposition for twodimensional random metals for sub10nm node design yongchan bana, and david z. In double patterning lithography dpl layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors corresponding to di.
The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Alignment method of selfaligned double patterning process. Consequently, patterning is also the driving force behind a multitude of advances in semiconductor manufacturing technologies. Double patterning lithography for 32nm half pitch node and beyond by, manikandansampathkumar u84037635 s 2.
Expanding the optical lithography to 32nm node and beyond is impossible using existing single exposure systems. The immaturity of next generation technologies means that existing. As a practical solution, pitch doubling technique known as double patterning lithography. Double patterning lithography for 32 nm spie digital library. Double patterning technology friendly detailed routing minsik cho, yongchan ban, and david z. Diffraction based overlay metrology for double patterning. Selfaligned double patterning sadp is popularly in. Node sizes of transistors made by companies like intel, toshiba, ibm, and amd are around 32nm and 22nm with the help of hypernumerical aperture immersion lithography systems. Timing yieldaware color reassignment and detailed placement perturbation for double patterning lithography mohit gupta, kwangok jeong, and andrew b.
Double patterning design split best focus difference 10nm best focus difference up to 4060nm overlapping dof current 100120nm expected to improve after further optimization e. Multiple patterning or multi patterning is a class of technologies for manufacturing integrated circuits ics, developed for photolithography to enhance the feature density. Delays in readiness of next generation lithography ngl suggest the use of existing methods to enable the production of key technologies at the 32 and 22nm halfpitch nodes. Sketch of a process scheme for line by fill double patterning. Although sadp is the critical technology to solve the lithography. Light source requirements for double patterning lithography tool are high power and high uptime to enhance economic efficiency, as. Advanced multipatterning and hybrid lithography techniques. Selfaligned double patterning sadp lithography is a novel lithography technology that has the intrinsic capability to reduce the overlay in the double patterning lithography dpl. Various double patterning techniques resist freeze process lithography performance of jsr freeze process. It will enable designers to develop chips for manufacture on subnanometer process nodes using current optical lithography systems.
Double patterning in nanoimprint lithography sciencedirect. Amorphous carbon may be used as a hard mask alternative to nitride in conjunction with multiple patterning lithography and linewidth trimming applications. Selfaligned double patterning developed in response to leles mask overlay issues single lithography step need to use an additional block or cut mask to remove unwanted material complicated to design masks for sadp process intensive c. Double patterning lithography dpl is one of the most likely shortterm solutions for keeping the pace of scaling beyond 32nm node 6. Layout decomposition for double patterning lithography.
Double patterning material solutions sokudosemi lithography breakfast forum 2008 mark slezak. Nanoimprint lithography and future patterning for semiconductor devices tatsuhiko higashiki tetsuro nakasugi ikuo yoneda downloaded from spie digital library on 18 nov 2011 to 216. Pdf amorphous carbon hard mask for multiple patterning. This years advanced lithography techxpot at semicon west will explore the progress on extreme ultraviolet lithography euvl and its economic viability for highvolume manufacturing hvm, as well as other lithography solutions that can address the march to 5nm and onward to 3nm.
Layout optimizations for double patterning lithography. Pdf double patterning technology dpt is a most likely lithography solution for 3222 nm technology nodes as of 2008 due to the delay of extreme. Double patterning lithography dpl is one of the most likely shortterm solutions for keeping the pace of scaling beyond 32nm node 2. Selfaligned double patterning lithography aware detailed routing with color preassignment yixiao ding, student member, ieee, chris chu, fellow, ieee and waikei mak, member, ieee, abstractas the technology nodes scale down to sub22nm, double patterning lithography dpl has been considered as a practical solution for layout manufacturing. Double pattern ing, multiple patterning, directed selfassembly dsa and other lithography enhancement techniques are used to achieve below 14 nm halfpitch today. Selfaligned double patterning lithography aware detailed routing. Selfaligned double patterning layout decomposition with. Double patterning is a common multiple patterning technique. High reliability arf light source for double patterning.
It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. Lithography is the transfer of geometric shapes on a mask to a smooth surface. Dpl has become a strong candidate for 22nm lithography process. The key problem is that in double patterning one mask layer is. Assessing chiplevel impact of double patterning lithography. Detailed routing for spacerismetal type selfaligned. It is used for transferring circuit patterns into the silicon wafer. Pdf advanced selfaligned double patterning development for sub. Multiple patterning enables feature shrink youtube. Selfaligned doublepatterning layout decomposition for. Diffraction based overlay metrology for double patterning technologies prasad dasari 1, jie li 1, jiangtao hu 1, nigel smith 1 and oleg kritsun 2 1nanometrics 2globalfoundries usa 1.
Continued scaling in semiconductor manufacturing with. Double patterning is a technique used in the lithographic process that defines the features of integrated circuits at advanced process nodes. Double patterning technology friendly detailed routing. Several clever multiple patterning strategies have been developed to create tiny, densely packed features on a chip. Andres torres advanced multi patterning and hybrid lithography techniques. Although the layout decomposition problem for lelele has. By assigning different values to a and b, the pdf takes a variety. A resolution enhancement from 250 nm resolution single exposure in 1995 to below 40 nm today was achieved by further improving the projection. Double patterning is the only lithography technique to be used for the 32 nm and 22 nm halfpitch nodes in 20082009 and 20112012, respectively, using tools already available today. Triple patterning lithography tpl layout decomposition. Double patterning and hypernumerical aperture immersion lithography mark amirtharaj zach kruder enee416 111711.
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